Effect of Annealing And of Cooling Rates on N-Gaas Electrode Photoelectrochemical Characteristics

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Journal Title, Volume, Page: 
Active and Passive Electronic Components Volume 27 (2004), Issue 2, Pages 69-80, doi:10.1080/0882751031000116115
Year of Publication: 
2004
Authors: 
Hikmat S. Hilal
College of Sciences, An-Najah N. University, P.O. Box 7, Nablus, West Bank, Palestinian Authority
Subhi K. Salih
Department of Physics, Faculty of Sciences, An-Najah National University, Palestine
Current Affiliation: 
Department of Physics, Faculty of Sciences, An-Najah National University, Palestine
Iyad A. Sa'adeddin
College of Sciences, An-Najah N. University, P.O. Box 7, Nablus, West Bank, Palestinian Authority
Guy Campet
Institut de Chimie de la Matiere Condensee de Bordeaux, Bordeaux University, Av. Dr. A. Schweitzer, Pessac 33608, France
Preferred Abstract (Original): 

The effect of annealing of the n-GaAs semiconductor on its characteristics in photoelectrochemical (PEC) systems has been investigated. The photocurrent densities vs potential plots were improved by annealing. Cell efficiency and short-circuit current densities were enhanced for the annealed n-GaAs.The effect of the rate of cooling of heated n-GaAs wafers was also investigated. It was found that the slowly cooled electrodes gave better dark current density vs. potential plots, for samples annealed below 600ºC. For samples annealed at higher temperatures, quenching gave better dark-current density vs potential plots. For n-GaAs, slowly cooled electrodes from temperatures below 600ºC showed better photocurrent densityvspotential plots and higher efficiency. n-GaAs samples, quenched from temperatures above 700ºC, showed better photocurrent density vs potential plots and higher efficiency than their slowly cooled counterparts.

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