conductivity | An-Najah Staff

Electrically Conducting Thin Films Obtained by Ion Implantation in Pyrolyzed ‎Polyacrylonitrile

Thu, 2014-04-03 11:34 — Shehdeh Jodeh

Journal Title, Volume, Page:

Material Research Innovations, Volume 4, Issue 2-3, pp 131-134

Year of Publication:

2001

Link:

http://link.springer.com/article/10.1007%2FPL00010781

Authors:

S. Jodeh

General Motors Research and Development, 30500 Mound Road, Warren, MI 48090-9055, USA

Current Affiliation:

Department of Chemistry, Faculty of Science, An-Najah National University, Nablus, Palestine

[email protected]

R. A. Basheer

General Motors Research and Development, 30500 Mound Road, Warren, MI 48090-9055, USA

Preferred Abstract (Original):

Heat treatment of polyacrylonitrile (PAN) leads to products with semiconductor-to-metal range of conductivities. The electrical properties of these materials are further modified by ion implantation. The conductivity, 1×10–7 (Ω cm)–1, of heat treated PAN at 435°C (PAN435) increases upon ion implantation with As+, Kr+, Cl+ or F+, reaching the maximum value of 8.9×10–1 (Ω cm)–1 at a dose of 5×1016 ion/cm2 and an energy of 200 KeV for the case of F+ implantation. On the other hand, ion implantation in the more conducting heat-treated PAN at 750 °C (PAN750) leads to a decrease in the electrical conductivity. It is shown that the conductivity modifications are primarily due to structural rearrangements induced by the energetic ions. Specific chemical doping contribution to conductivity is noted for halogen implantation in PAN435. The temperature dependence of conductivity of PAN heat treated at 750°C suggests a two path conduction, namely a three dimensional variable range hopping conduction and a metallic conduction. After ion implantation, the conductivity-temperature dependence is interpreted in terms of a variable range hopping conduction mechanism.

The Study of the Effects of Ion Chemical Activity on Conductivity of ‎Poly (Dimethylsilylene-Co- Methylphenylsilylene)‎

Thu, 2014-04-03 10:09 — Shehdeh Jodeh

Journal Title, Volume, Page:

J. of Active and Passive Electronic Devices, Vol. 2, pp. 25-42

Year of Publication:

2006

Link:

http://blogs.najah.edu/staff/sjodeh/article/The-Study-of-the-Effects-of-Ion-Chem...

Authors:

Shehdeh Jodeh

Department of Chemistry, Faculty of Science, An-Najah National University, Nablus, Palestine

Current Affiliation:

Department of Chemistry, Faculty of Science, An-Najah National University, Nablus, Palestine

[email protected]

Preferred Abstract (Original):

The effects of ion implantation on the electrical and structural properties of poly(dimethylsilylene-co-methylphenylsilylene), DMMPS, thin films have been investigated. Ionic species of krypton, arsenic, fluorine, ch1orine, and sulfur were implanted at energies ranging from 35 to 200 keV and with doses of up to 1 x 1016 ion/cm2. The conductivity of the polymer increased, upon implantation, reaching a maximum value of 9.6 x 10-6 (Ωcm)-l for the case of arsenic ion at a dose of 1 x 1016 ion/cm2 and energy of 100 keV. The results showed that ion implantation induced conduction, in DMMPS, was primarily due to structural modifications of the material brought about by the energetic ions. Infrared analysis and Auger electron spectroscopy showed evidence for the formation of a silicon carbide-like structure upon implantation.