Chromium nitride

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Characterization Analysis of Chromium Nitride Reactively Sputtered Deposited Coating on Aluminum Alloy

Journal Title, Volume, Page: 
J. Active and passive Electronics. Vol 2, 1-10
Year of Publication: 
2007
Authors: 
S. W. JODEH
Chemistry Department, An-Najah National University, Nablus, Palestine
Current Affiliation: 
Department of Chemistry, Faculty of Science, An-Najah National University, Nablus, Palestine
Sharif. M. Musameh
Physics Department, An- Najah National University, Nablus, P.O. Box 7. , Palestine
Preferred Abstract (Original): 

The possibility of significantly improving the wear resistance, corrosion and friction behavior of aluminum alloys for automobile engine applications is demonstrated by using a chrome nitride (CrN) coating. Thin films of CrxN1−x were deposited on aluminum 6061 using a reactive sputtering technique in an unbalanced magnetron deposition system. The hardness and elastic modulus of the films were measured using a nanoindentation technique. A CrN film of a few micrometers thick was shown to significantly improve the wear resistance of aluminum alloy. The reduction of adhesive wear by the presence of a CrxN1−x coating on the surface of the aluminum alloy is believed to be responsible.

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Tribological Behavior of Chromium Nitride Coating by Unbalanced Magnetron ‎Sputtering

Journal Title, Volume, Page: 
J. Active and Passive Electronic Devices, 3,17-25
Year of Publication: 
2007
Authors: 
Shehdeh Jodeh
Chemistry Department , An-Najah National University, Nablus, Palestine
Current Affiliation: 
Department of Chemistry, Faculty of Science, An-Najah National University, Nablus, Palestine
Musameh Sharif
Physics Department, An- Najah National University, Nablus, P.O. Box 7. , Palestine
Preferred Abstract (Original): 

The possibility of improving tribological properties of aluminum alloys using a chrome nitride coating is exploded. Thin films of CrxN1−xwere deposited on aluminum 6061 using a reactive sputtering technique in an unbalanced magnetron deposition system. The structure, composition, and morphology of the deposited thin films were characterized by using x-ray diffraction (XRD), scanning electron microscopy (SEM), electron – probe microanalysis (EPMA), and x-ray photoelectron spectroscopy (XPS).

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