The Mechanism of Cleavage of Si- Ge Bond by Base

Journal Title, Volume, Page:

Journal of Organometallic Chemistry Volume 205, Issue 1, Pages 47–51

Year of Publication:

1981

Link:

http://www.sciencedirect.com/science/article/pii/S0022328X00829356

Authors:

Foad M.S. Mahmoud

School of Molecular Sciences, University of Sussex, Brighton BN1 9QJ Great Britain

Current Affiliation:

Department of Chemistry, Faculty of Science, An-Najah National University, Nablus, Palestine

[email protected]

Colin Eaborn

School of Molecular Sciences, University of Sussex, Brighton BN1 9QJ Great Britai

Preferred Abstract (Original):

The compounds R₃SiGePh₃ with R = Me or Et have been shown to undergo cleavage in NaOMe-MeOH to give Ph₃GeH. From rate measurements and solvent isotope effect studies it is concluded that the Ph₃Ge⁻anion separates in the rate-determining transition state. There is an unusually large steric effect, Me₃SiGePh₃ being roughly 1300 times as reactive as Et₃SiGePh₃.

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The Mechanism of Cleavage of Si- Ge Bond by Base