Base Cleavage of the Benzyl−Silicon Bond in PhCH2SiMe2(CH2)nOH (n = 2 or 3) Compounds

Journal Title, Volume, Page:

Journal of Organometallic Chemistry Volume 209, Issue 1, Pages 13–16

Year of Publication:

1981

Link:

http://www.sciencedirect.com/science/article/pii/S0022328X0088969X

Authors:

Foad M.S. Mahmoud

School of Molecular Sciences, University of Sussex, Brighton BN1 9QJ Great Britain

Current Affiliation:

Department of Chemistry, Faculty of Science, An-Najah National University, Nablus, Palestine

[email protected]

Colin Eaborn

School of Molecular Sciences, University of Sussex, Brighton BN1 9QJ Great Britain

Preferred Abstract (Original):

The compounds PhCH₂SiMe₂(CH₂)_nOH with n = 2 or 3 arecleaved 0.75 and 95135 times, respectively, as readily as PhCH₂SiMe₃ by NaOMe/MeOH at 50⁰C. The high reactivity of the compound with _n = 3 may arise from intramolecular attack of the alkoxide centre on silicon in the anion PhCH₂SiMe₂(CH₂)₃O^-.

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Base Cleavage of the Benzyl−Silicon Bond in PhCH2SiMe2(CH2)nOH (n = 2 or 3) Compounds